Abstract
The semiconductor and display industries employ microfabrication and high-density technology to enhance the performance of IT products. Current micro-patterning methods primarily rely on photolithography. However, photolithography is a complex and expensive process, with limited freedom of pattern design, and involves dry etching methods that use toxic substances, which are harmful..... More

Abstract
We investigated the effect of rapid thermal annealing (RTA) temperature report on oxygendeficient rutile TiO_2-x thin-film transistors deposited by RF magnetron sputtering. Amorphous TFTs that use TiO_2-x semiconductors as an active layer can be fabricated by low-temperature process and show remarkable electrical performance. The RTA post-annealing process provides greater production..... More