| Home | E-Submission/Review | Sitemap | Editorial Office |  
Korean Journal of Metals and Materials Search > Browse Articles > Search

Formation of Surface-Wrinkled Metal Nanosheets via Thermally Assisted Nanotransfer Printing
열보조 나노 전사 프린팅을 통한 금속 박막의 표면 주름 나노패턴 형성 방법
Tae Wan Park, Woon Ik Park
박태완, 박운익
Korean J. Met. Mater. 2021;59(12):880-885.   Published online 2021 Nov 19
DOI: https://doi.org/10.3365/KJMM.2021.59.12.880

Nanopatterning methods for pattern formation of high-resolution nanostructures are essential for the fabrication of various electronic devices, including wearable displays, high-performance semiconductor devices, and smart biosensor systems. Among advanced nanopatterning methods, nanotransfer printing (nTP) has attracted considerable attention due to its process simplicity, low cost, and great pattern resolution. However,..... More

Pattern Transfer Printing by Controlling the Deposition Angle to Form Various Patterns
증착 각도 조절 기반 패턴전사프린팅을 통한 패턴 형상의 제어
Tae Wan Park, Woon Ik Park
박태완, 박운익
Korean J. Met. Mater. 2020;58(2):145-150.   Published online 2020 Jan 8
DOI: https://doi.org/10.3365/KJMM.2020.58.2.145

The nanofabrication of modern electronic devices requires advanced nanopatterning technologies. To fabricate desirable nanodevices with excellent device performance, controlling the shape and dimension of the pattern is very important. However, to achieve more facile and faster device fabrication, with better pattern resolution, pattern-tunability, process simplicity, and cost-effectiveness, some remaining challenges..... More

                   Web of Science 1  Crossref 1
Effect of Surface Roughness on the Formation of Nano-to-Mirco Patterns Using Pattern Transfer Printing
나노-마이크로 패턴의 형성에 미치는 기판의 표면 거칠기 영향
Tae Wan Park, Myunghwan Byun, Hyunsung Jung, Woon Ik Park
박태완, 변명환, 정현성, 박운익
Korean J. Met. Mater. 2020;58(1):26-31.   Published online 2019 Dec 12
DOI: https://doi.org/10.3365/KJMM.2020.58.1.26

The ability to form high quality nano-/micro- patterns is very important for the nanofabrication of high-density electronic devices. However, remaining challenges have yet to be resolved, including low quality roughness, low pattern resolution, and the highly complex process. In this study, we suggest a novel and simple method for creating..... More

                   Web of Science 1
1 |
Email Alert
Author's Index
Journal Impact Factor 1.2
The Korean Institute of Metals and Materials
SCImago Journal & Country Rank
Similarity Check
Crossref Cited-by Linking
Editorial Office
The Korean Institute of Metals and Materials
6th Fl., Seocho-daero 56-gil 38, Seocho-gu, Seoul 06633, Korea
TEL: +82-2-557-1071   FAX: +82-2-557-1080   E-mail: metal@kim.or.kr
About |  Browse Articles |  Current Issue |  For Authors and Reviewers
Copyright © The Korean Institute of Metals and Materials.                 Developed in M2PI