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Effect of Surface Roughness on the Formation of Nano-to-Mirco Patterns Using Pattern Transfer Printing
나노-마이크로 패턴의 형성에 미치는 기판의 표면 거칠기 영향
Tae Wan Park, Myunghwan Byun, Hyunsung Jung, Woon Ik Park
박태완, 변명환, 정현성, 박운익
Korean J. Met. Mater. 2020;58(1):26-31.   Published online 2019 Dec 12
DOI: https://doi.org/10.3365/KJMM.2020.58.1.26

Abstract
The ability to form high quality nano-/micro- patterns is very important for the nanofabrication of high-density electronic devices. However, remaining challenges have yet to be resolved, including low quality roughness, low pattern resolution, and the highly complex process. In this study, we suggest a novel and simple method for creating..... More

                        
Optimization of the CMP Process with Colloidal Silica Performance for Bulk AlN Single Crystal Substrate
Hyo Sang Kang, Joo Hyung Lee, Jae Hwa Park, Hee Ae Lee, Won Il Park, Seung Min Kang, Sung Chul Yi
Korean J. Met. Mater. 2019;57(9):582-588.   Published online 2019 Aug 21
DOI: https://doi.org/10.3365/KJMM.2019.57.9.582

Abstract
Chemical mechanical polishing (CMP) of bulk AlN was performed with colloidal silica slurry at pH 9 for different times. The result shows that colloidal silica slurry at pH 9, which has the relatively high surface charge of -50.7 mV is most stable, and it was selected as chemically optimum condition..... More

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