Abstract
The ability to form high quality nano-/micro- patterns is very important for the nanofabrication of high-density electronic devices. However, remaining challenges have yet to be resolved, including low quality roughness, low pattern resolution, and the highly complex process. In this study, we suggest a novel and simple method for creating..... More

Abstract
Chemical mechanical polishing (CMP) of bulk AlN was performed with colloidal silica slurry at pH 9 for different times. The result shows that colloidal silica slurry at pH 9, which has the relatively high surface charge of -50.7 mV is most stable, and it was selected as chemically optimum condition..... More