Abstract
Transparent TiO₂ single layer and TiO₂/Ag/TiO₂(TAT) tri-layer films were deposited by DC and RF magnetron sputter on a polyimide substrate at room temperature. During the TAT deposition, the thickness of the TiO₂ layer was kept at 20 nm, while the Ag interlayer was varied as 10, 15, 20 nm to..... More

Abstract
Transparent and conductive ZnO 50 nm/Au 8 nm/ZnO 50 nm tri-layer films were deposited on poly-imide films by radio frequency (RF) and direct current (DC) magnetron sputtering at room temperature, and then the effect of electron irradiation on the crystallization, electrical resistivity and optical properties of the films was considered..... More