Effect of Process Parameters on the Angular Distribution of Sputtered Cu Flux in Long-Throw Sputtering System
Hee-Young Shin, Tae-Ho Kim, Jun-Woo Park, Hyun-Chul Sohn
Korean J. Met. Mater.. 2019;57(7):462-467.   Published online 2019 Jun 5     DOI: https://doi.org/10.3365/KJMM.2019.57.7.462
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