Deposition of Low-Resistivity Aluminum Thin Films Via Application of Substrate Bias During Magnetron Sputtering
Dooho Choi
Korean J. Met. Mater.. 2020;58(10):715-720.   Published online 2020 Oct 5     DOI: https://doi.org/10.3365/KJMM.2020.58.10.715
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